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Applied Physics A: Materials Science and Processing

Volumn 106, Issue 4, 2012, Pages 853-861

Photothermal laser processing of thin silicon nanoparticle films: On the impact of oxide formation on film morphology

(5) Behrenberg, Dennis a Franzka, Steffen a Petermann, Nils a Wiggers, Hartmut a Hartmann, Nils a

a UNIVERSITY OF DUISBURG ESSEN (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AIR PRESSURES; AVERAGE DIAMETER; COMPARATIVE EXPERIMENTS; CW-LASER; EXPERIMENTAL PARAMETERS; FILM MORPHOLOGY; GRANULAR STRUCTURESS; IN-VACUUM; LASER POWER; LASER PROCESS; LASER SPOT SIZE; MECHANISTIC ASPECTS; MESOPOROUS; MICROSCOPIC TECHNIQUES; OXIDE FORMATION; OXYGEN ADSORPTION; PHOTO-THERMAL; PHOTOVOLTAIC; PROCESSING PARAMETERS; PROCESSING TECHNIQUE; SILICON FILMS; SILICON NANOPARTICLES; SILICON SUBSTRATES; SURFACE LAYERS; SURFACE OXIDATIONS; SURFACE OXIDE LAYER; THERMOELECTRIC APPLICATION; WRITING SPEED;

ATMOSPHERIC PRESSURE; GAS ADSORPTION; LASER OPTICS; METALLIC FILMS; MORPHOLOGY; OXIDE FILMS;

SILICON;

EID: 84858865853 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-012-6779-8 Document Type: Article

Times cited : (12)

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