Thermoelectric effect in laser annealed printed nanocrystalline silicon layers

Physica Status Solidi - Rapid Research Letters

Volumn 1, Issue 6, 2007, Pages 262-264

  Lechner, Robert ^a   Wiggers, Hartmut ^b   Ebbers, André ^c   Steiger, Jürgen ^c   Brandt, Martin S ^a   Stutzmann, Martin ^a  

^a WALTER SCHOTTKY INSTITUT   (Germany)

^b UNIVERSITY OF DUISBURG ESSEN   (Germany)

^c EVONIK INDUSTRIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BORON; CONDUCTIVE FILMS; ETHANOL; LASERS; MOLECULAR BEAM EPITAXY; NANOCRYSTALLINE ALLOYS; NANOCRYSTALLINE MATERIALS; NANOCRYSTALLINE SILICON; NANOSTRUCTURED MATERIALS; NONMETALS; PHOSPHORUS; PULSED LASER DEPOSITION; SILICON;

CONDUCTIVE LAYERS; FLEXIBLE SUBSTRATES; LASER ENERGY DENSITY; MICROWAVE REACTORS; NANO CRYSTALLINE; PHOSPHORUS DOPING; PULSED LASER ANNEALING (PLA); SILICON LAYERS; SPIN-COATED FILMS;

PULSED LASER APPLICATIONS;

EID: 41349118415     PISSN: 18626254     EISSN: 18626270     Source Type: Journal    
DOI: 10.1002/pssr.200701198     Document Type: Article

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