Maskless pattern transfer using 355 nm laser

Optics and Lasers in Engineering

Volumn 50, Issue 5, 2012, Pages 710-716

  Gabran, S R I ^a   Mansour, R R ^a   Salama, M M A ^a  

^a UNIVERSITY OF WATERLOO   (Canada)

Author keywords

Laser material processing; Maskless lithography; Microfabrication; Photolithography

Indexed keywords

355 NM LASER; ABLATION PROCESS; DIFFERENT SUBSTRATES; FINITE ELEMENT; LASER MATERIAL PROCESSING; LASER PARAMETERS; LOW POWER; MASK LESS; MASKLESS LITHOGRAPHY; METAL DEPOSITION; MICRO-MOLDS; ND : YAG LASERS; ORGANIC FILMS; PATTERN TRANSFERS; PROCESS QUALITY; PROCESS VARIABLES; QUANTITATIVE STUDY; THERMAL MODEL; THICK PHOTORESISTS;

MICROFABRICATION; NEODYMIUM LASERS; PHOTOLITHOGRAPHY; PHOTORESISTS; RAPID PROTOTYPING; ULTRAVIOLET LASERS;

ORGANIC LASERS;

EID: 84858798781     PISSN: 01438166     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optlaseng.2011.11.020     Document Type: Article

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