RIE of the polyimide micromechanical structures

ASDAM 2000 - Conference Proceedings: 3rd International EuroConference on Advanced Semiconductor Devices and Microsystems

Volumn , Issue , 2000, Pages 469-473

  Matay, L ^a   Kostic I ^a   Hrkut P ^a   Andok, R ^a  

^a INSTITUTE OF INFORMATICS   (Slovakia)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMECHANICAL DEVICES; MICROELECTRONICS; MICROSYSTEMS; POLYIMIDES; REACTIVE ION ETCHING;

MICROMECHANICAL STRUCTURES;

SEMICONDUCTOR DEVICES;

EID: 3042566722     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ASDAM.2000.889547     Document Type: Conference Paper

References (7)

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2. F. Kataoka, H Suzuki: Processing of Polyimides and Related Topics. In: K. Horie, T. Yamashita (eds.): Photosensitive Polyimides-Fundamentals and Applications. TECHNOMIC® Publishing Co., Inc., Lancaster, Pennsylvania (1995), pp. 231-286.
3. F. D. Egitto, L. J. Matienzo: Plasma Surface Modification and Etching of Polyimides. In: M. K. Ghosh, K. L. Mittal (eds.): Polyimides-Fundamentals and Applications. Marcel Dekker, Inc., New York (1996), pp. 389-452.
4. D. M. Manos, D. L. Flamm: Plasma Etching. Academic Press, Inc., London (1989).
5. W. M. Moreau: Semiconductor Lithography-Principles, Practices, and Materials. In: Subtractive Etching. Plenum Press, New York and London (1988), pp. 631-778.
6. P. M. Scott, L. J. Matienzo, S. V. Babu: CF4 /O2 Plasma Etching and Surface Modification of Polyimide Films / Time-Dependent Surface Fluorination Model. J. Vac. Sci. Technol. A8, 3 (1990), pp. 2382-2387.
7. T. Yamada, R. Inanami, S. Morita: Polyimide Transmitted e-Beam Excited CF4 Plasma Etching. Thin Solid Films 316 (1998), pp. 13-17.