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Volumn 2, Issue , 1999, Pages 368-
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Deposition of carbon nitride films by laser techniques
a
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Author keywords
[No Author keywords available]
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Indexed keywords
AUGER ELECTRON SPECTROSCOPY;
CARBON INORGANIC COMPOUNDS;
CHEMICAL VAPOR DEPOSITION;
EMISSION SPECTROSCOPY;
EXCIMER LASERS;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
LASER ABLATION;
MASS SPECTROMETRY;
NITRIDES;
NITROGEN;
THIN FILMS;
WAVELENGTH DISPERSIVE SPECTROSCOPY;
BROMINE COMPOUNDS;
CARBON FILMS;
CARBON NITRIDE;
CHEMICAL BONDS;
CHLORINE COMPOUNDS;
COPPER COMPOUNDS;
DEPOSITION;
DEPOSITION RATES;
PULSED LASER DEPOSITION;
VAPOR DEPOSITION;
LASER INDUCED CHEMICAL VAPOR DEPOSITION;
OPTICAL EMISSION SPECTROSCOPY;
PULSED LASER DEPOSITION;
QUADRUPOLE MASS SPECTROMETRY;
PULSED LASER APPLICATIONS;
PULSED LASERS;
BONDING STRUCTURE;
CARBON NITRIDE FILMS;
LASER INDUCED;
LASER INDUCED CHEMICAL VAPOR DEPOSITION;
LASER TECHNIQUE;
PROCESS MECHANISMS;
PULSE MODULATED;
THIN-FILM DEPOSITIONS;
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EID: 0033314569
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
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Times cited : (1)
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References (0)
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