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Volumn 520, Issue 10, 2012, Pages 3751-3754

In-situ analyses on the reactive sputtering process to deposit Al-doped ZnO films using an Al-Zn alloy target

(3) Tsukamoto, Naoki a Oka, Nobuto a Shigesato, Yuzo a

Author keywords

Al doped ZnO (AZO); Energetic negative ion; In situ analyses; Positive ion; Reactive sputtering; Transparent conducting oxide (TCO)

Indexed keywords

AL-DOPED ZNO; AL-ZN ALLOY; AZO FILMS; CATHODE VOLTAGES; CHARGE EXCHANGES; CONVENTIONAL MAGNETRON SPUTTERING; DOUBLE FEEDBACK; HIGH ENERGY; IN-SITU ANALYSIS; QUADRUPOLE MASS SPECTROMETER; REACTIVE SPUTTERING PROCESS; SPUTTERING SYSTEMS; TARGET SURFACE; TRANSPARENT CONDUCTING OXIDE;

CATHODES; CHARGE TRANSFER; CONDUCTIVE FILMS; DEPOSITS; ELECTRIC PROPERTIES; ION BOMBARDMENT; KINETIC ENERGY; KINETICS; NEGATIVE IONS; OXIDE FILMS; POSITIVE IONS; REACTIVE SPUTTERING; ZINC; ZINC ALLOYS; ZINC OXIDE;

ALUMINUM;

EID: 84858339839 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.08.031 Document Type: Conference Paper

Times cited : (16)

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