Modeling of the plasma impedance in reactive magnetron sputtering for various target materials

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 2005, Pages 298-301

  Pflug, A ^a   Siemers, M ^a   Szyszka, B ^a   Kappertz, O ^b   Nyberg, T ^b   Berg, S ^b   Severin, D ^c   Wuttig, M ^c  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

^b UPPSALA UNIVERSITY   (Sweden)

^c UNIVERSITY HOSPITAL RWTH AACHEN   (Germany)

Author keywords

Plasma impedance; Reactive sputtering; Secondary electron emission; Simulation

Indexed keywords

CHEMISORPTION; COATINGS; COMPUTER SIMULATION; ELECTRIC POTENTIAL; FLUID MECHANICS; PROCESS CONTROL;

PLASMA IMPEDANCE; SECONDARY ELECTRON EMISSION;

MAGNETRON SPUTTERING;

EID: 33644968815     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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