Spatial distribution of electrical properties for Al-doped ZnO films deposited by dc magnetron sputtering using various inert gases

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 28, Issue 4, 2010, Pages 895-900

  Sato, Yasushi ^a   Ishihara, Keita ^a   Oka, Nobuto ^a   Shigesato, Yuzo ^a  

^a AOYAMA GAKUIN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AL-DOPED ZNO; AZO FILMS; DC MAGNETRON SPUTTERING; ELECTRICAL PROPERTY; HIGH-ENERGY PARTICLES; PLASMA IMPEDANCE; SECONDARY ELECTRON EMISSIONS; SPATIAL DISTRIBUTION; SPUTTERING GAS; SPUTTERING VOLTAGE; TARGET SURFACE;

ALUMINUM; ELECTRIC DISCHARGES; INERT GASES; KRYPTON; SIZE DISTRIBUTION; SPUTTERING; XENON; ZINC OXIDE;

ELECTRIC PROPERTIES;

EID: 77954205775     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3319357     Document Type: Conference Paper

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