High rate reactive magnetron sputter deposition of Al-doped ZnO with unipolar pulsing and impedance control system

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 28, Issue 4, 2010, Pages 890-894

  Nishi, Yasutaka ^a   Hirohata, Kento ^a   Tsukamoto, Naoki ^a   Sato, Yasushi ^a   Oka, Nobuto ^a   Shigesato, Yuzo ^a  

^a AOYAMA GAKUIN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AL-DOPED ZNO; AZO FILMS; CONVENTIONAL SPUTTERING; DISCHARGE POWER; FEEDBACK SYSTEMS; FLOW RATIOS; GLASS SUBSTRATES; HIGH RATE; IMPEDANCE CONTROL; MAGNETRON SPUTTER DEPOSITION; MID-FREQUENCY; QUARTZ GLASS SUBSTRATES; TARGET SURFACE; TRANSITION REGIONS; UNI-POLAR PULSING; UNIPOLAR PULSE; VISIBLE REGION; ZNAL ALLOY;

DEPOSITION RATES; GLASS; MAGNETRONS; OXIDE FILMS; OXIDE MINERALS; QUARTZ; SUBSTRATES; TARGETS; ZINC; ZINC ALLOYS; ZINC OXIDE;

ALUMINUM;

EID: 77954186611     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3308621     Document Type: Conference Paper

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