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Volumn 24, Issue 10, 2012, Pages 1304-1308

Two-photon continuous flow lithography

(6) Laza, Simona C a Polo, Marco a Neves, Antonio A R a Cingolani, Roberto b Camposeo, Andrea a,b Pisignano, Dario a,b,c

a NATIONAL NANOTECHNOLOGY LABORATORY (Italy)

b ISTITUTO ITALIANO DI TECNOLOGIA (Italy)

c UNIVERSITY OF SALENTO (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

BOW TIE; CONTINUOUS FLOWS; MULTIPLE BEAM; POLYMERIC FIBERS; POLYMERIC PARTICLES; SUB-DIFFRACTION; SUBMICROMETERS; TWO PHOTON; TWO-PHOTON LITHOGRAPHY;

PHOTONS; POLYMERS; SURFACE ROUGHNESS;

LITHOGRAPHY;

POLYMER;

ARTICLE; CHEMISTRY; LASER; METHODOLOGY; PHOTON; PRINTING;

LASERS; PHOTONS; POLYMERS; PRINTING;

EID: 84858015903 PISSN: 09359648 EISSN: 15214095 Source Type: Journal
DOI: 10.1002/adma.201103357 Document Type: Article

Times cited : (61)

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