SCOPUS 정보 검색 플랫폼

Volumn 47, Issue 7, 2012, Pages 3233-3240

Reducing electrical resistance in single-walled carbon nanotube networks: Effect of the location of metal contacts and low-temperature annealing

(4) Zhang, Qinghui a Vichchulada, Pornnipa a Shivareddy, Shruthi B a Lay, Marcus D a

a UNIVERSITY OF GEORGIA (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRICAL RESISTANCES; LOW TEMPERATURE ANNEALING; LOW TEMPERATURES; METAL CONTACTS; METALLIC CONDUCTION; RELATIVE CONTRIBUTION; REPRODUCIBILITIES; SEMICONDUCTIVE; SINGLE-WALLED CARBON NANOTUBE NETWORKS; TI ELECTRODE; TUNNELING JUNCTIONS;

CONTACTS (FLUID MECHANICS); FILMS; TEMPERATURE;

ELECTRIC PROPERTIES;

EID: 84857654280 PISSN: 00222461 EISSN: 15734803 Source Type: Journal
DOI: 10.1007/s10853-011-6161-9 Document Type: Article

Times cited : (9)

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- Itkis, M.E.¹ Perea, D.E.² Jung, R.³ Niyogi, S.⁴ Haddon, R.C.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.