Rational design of etchants for electroless porous silicon formation

ECS Transactions

Volumn 33, Issue 16, 2010, Pages 23-28

  Kolasinski, Kurt W ^a   Gogola, Jacob W ^a  

^a WEST CHESTER UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROLYTIC POLISHING; ETCHING; FLUORINE COMPOUNDS; OXIDANTS; POROUS SILICON; SURFACE CHEMISTRY;

ACIDIC FLUORIDE SOLUTIONS; ETCHING REACTION; FILM HOMOGENEITY; FLUORIDE SOLUTION; OXIDANT CONCENTRATIONS; OXIDE FORMATION; POROUS SILICON FORMATION; RATIONAL DESIGN;

SILICON COMPOUNDS;

EID: 84857436005     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3553152     Document Type: Conference Paper

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