Stain etching with ferric ion to produce thick porous silicon films

ECS Transactions

Volumn 16, Issue 3, 2009, Pages 323-328

  Dudley, M E ^a,b   Kolasinski, K W ^a  

^a WEST CHESTER UNIVERSITY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CERIUM COMPOUNDS; CHLORINE COMPOUNDS; ETCHING; HYDROFLUORIC ACID; IRON COMPOUNDS; LUMINESCENCE; VANADIUM PENTOXIDE;

DUAL LAYER STRUCTURE; EXCITATION WAVELENGTH; MICROPOROUS SILICON; PHOTOLUMINESCENCE EXCITATION SPECTROSCOPY; PL INTENSITY; STAIN ETCHING; THICK POROUS SILICON; UPPER LAYER;

POROUS SILICON;

EID: 63849319172     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2982571     Document Type: Conference Paper

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