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Volumn 37, Issue 4, 2012, Pages 563-565

Sub-100 nm structuring of indium-tin-oxide thin films by sub-15 femtosecond pulsed near-infrared laser light

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION THRESHOLDS; FEMTOSECOND PULSED LASER; FEMTOSECONDS; HIGH REPETITION RATE; INDIUM TIN OXIDE; LATERAL DIMENSION; NEAR INFRARED; NEAR-INFRARED LASERS; OXYGEN CONTENT; RADIANT EXPOSURE; SUB-100 NM; SUBTHRESHOLD;

EID: 84857289912     PISSN: 01469592     EISSN: 15394794     Source Type: Journal    
DOI: 10.1364/OL.37.000563     Document Type: Article
Times cited : (23)

References (25)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.