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Volumn 37, Issue 4, 2012, Pages 563-565
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Sub-100 nm structuring of indium-tin-oxide thin films by sub-15 femtosecond pulsed near-infrared laser light
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Author keywords
[No Author keywords available]
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Indexed keywords
ABLATION THRESHOLDS;
FEMTOSECOND PULSED LASER;
FEMTOSECONDS;
HIGH REPETITION RATE;
INDIUM TIN OXIDE;
LATERAL DIMENSION;
NEAR INFRARED;
NEAR-INFRARED LASERS;
OXYGEN CONTENT;
RADIANT EXPOSURE;
SUB-100 NM;
SUBTHRESHOLD;
HYDROCHLORIC ACID;
INDIUM;
INFRARED DEVICES;
MAGNETRONS;
NANOWIRES;
TIN;
THIN FILMS;
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EID: 84857289912
PISSN: 01469592
EISSN: 15394794
Source Type: Journal
DOI: 10.1364/OL.37.000563 Document Type: Article |
Times cited : (23)
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References (25)
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