Transparent Conducting Oxide Materials and Technology

Flexible Flat Panel Displays

Volumn , Issue , 2005, Pages 79-98

  Paine, David C ^a   Yeom, Hyo Young ^a   Yaglioglu, Burag ^a  

^a BROWN UNIVERSITY   (United States)

Author keywords

Dopant; Physical vapor deposition (PVD); Polymer; Roll to roll web coating; Sn doped In2O3 (ITO); Transparent conducting oxides (TCOs); Transparent conductors; Zn stabilized amorphous indium oxide (IZO)

Indexed keywords

EID: 84889477273     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1002/0470870508.ch5     Document Type: Chapter

References (43)

1. Baedeker, K. (1907) Uber die elektrische Leitfahigkeit und die thermoelektrische Kraft einiger Schwermetallverbindungen. Annals of Physics 22, 749-766.
2. Bellingham, J. R., Phillips, W. A., and Adkins, J. C. (1990) Electrical and optical properties of amorphous indium oxide. Journal of Physics: Condensed Matter 2(28), 6201.
3. Cannard, P. J and Tilley, R. J. D. (1988) New intergrowth phases in the ZnO-In2O3 system. Journal of Solid State Chemistry 73, 418-426.
4. Chapman, B. N. (1980) Glow Discharge Processes. John Wiley & Sons, Inc. New York, p. 70.
5. Frank, G. and Kostlin, H. (1982) Electrical and optical properties of indium oxide. Applied Physics A 27, 197-203.
6. Freeman, A. J., Poeppelmeier, K. R., Mason, T. O., Chang, R. P. H., and Marks, T. J. (2000) Chemical and thin film strategies for new transparent conducting oxide. MRS Bulletin 25, 45-51.
7. Gonzalez, G., Cohen, J., Hwang, J. H., Mason, T., Hodges, J., and Jorgensen, J. (2000) Defect structures of indium tin oxide and its relationship to conductivity. In Proceedings of the International Conference on Mass and Charge Transport in Inorganic Materials, Vincenzini P. (ed. ), Techna, Faenza, Italy.
8. Haacke, G. (1976) New figure of merit for transparent conductors. Journal of Applied Physics 47, 4086-4088.
9. Hiramatsu, H., Ueda, K., Ohta, H., Hirano, M., Kamiya, T. and Hosono, H. (2003) Thin Solid Films 445, 304-308.
10. Jackson, T., MRS Fall Meeting 2003, symposium X.
11. Jung, Y. S., Seo, J. Y., Lee, D. W. and Jeon, D. Y. (2003) Influence of DC magnetron sputtering on the properties of amorphous indium zinc oxide thin film. Thin Solid Films 445, 63-71.
12. Kaijo, A., Inoue, K., Matsuzaki, S. and Shigesato, Y. (2001) Practical properties of indium zinc oxide for thin film transistor liquid crystal displays. In Proceedings of the Fourth Pacific Rim International Conference on Advanced Materials and Processing.
13. Kaijou, A., Ohyama, M., Shibata, M. and Inoue, K. (1999) Transparent electrically conductive layer, electrically conductive transparent substrate and electrically conductive material, US Patent 5,972,527.
14. Kon, M., Song, P. K., Shigestao,Y., Frach, P., Ohno, S. and Suzuki, K. (2002) Al-doped ZnO films deposited by reactive magnetron sputtering in mid-frequency mode with dual cathodes. Japanese Journal of Applied Physics 41, 814-819.
15. Kon, M., Song, P. K., Shigestao, Y., Frach, P., Ohno, S. and Suzuki, K. (2003) Impedence control of reactive sputtering process in mid-frequency mode with dual cathodes to deposit Al-doped ZnO films. Japanese Journal of Applied Physics 42, 263-269.
16. Kostlin, H., Jost, R. and Lems,W. (1975) Optical and electrical properties of doped In2O3 films. Physica Status Solidi (a), 29, 87-93.
17. Kukla, R., Ludwig, R. and Meinel, J. (1996) Overview of Modern vacuum web coating technology. Surface Coatings Technology 86/7, 753-761.
18. Lievens, H. (1995) Wide web coating of complex materials. Surface Coatings Technology 76/77, 744-753.
19. MacDiarmid, A. G. (2002) Synthetic metals: a novel role for organic polymers, Synthetic Metals 125, 11-22.
20. Marcel, C., Naghavi, N., Couturier, G., Salardenne, J. and Tarascon, J. M. (2002) Scattering mechanisms and electronic behavior in transparent conducting ZnxIn2Ox {thorn} 3 oxide thin films. Journal of Applied Physics 91(7), 4291-4297.
21. Minami, T., Sonohara, H., Kakumu, T. and Takata, S. (1995) Highly transparent and conductive Zn2In2O5 thin films prepared by RF magnetron sputtering. Journal of Applied Physics 34, L971-L974.
22. Minami, T., Takeda, Y., Takeda, S. and Kakumu, T. (1997) Preparation of transparent conducting In4Sn3O12 thin films by DC magnetron sputtering. Thin Solid Films 308/9, 13-18.
23. Minami, T., Miyata, T. and Yamamoto, T. (1998) Work function of transparent conducting multicomponent oxide thin films prepared by magnetron sputtering. Surface Coatings Technology 109, 583-587.
24. Minami, T., Miyata, T. and Yamamoto, T. (1999) Stability of transparent conducting oxide films for use at high temperatures. Journal of Vacuum Science and Technology A 17, 1822-1826.
25. Minami, T., Yamamoto, T., Toda, Y. and Miyata, T. (2000) Transparant conducting zinc-co-doped ITO films prepared by magnetron sputtering. Thin Solid Films 373, 189-194.
26. Moriga, T., Edwards, D., Mason, T. O., Palmer, G. B., Poeppelmeier, K. R., Kannewurf, C. R. and Nakabayashi, I. (1998) Phase relationships and physical properties of homologous compounds in the zinc oxide-indium oxide system. Journal of the American Ceramic Society 81(5), 1310-1316.
27. Morikawa, H. and Fujita, M. (2000) Crystallization and electrical property change on the annealing of amorphous indium-oxide and indium-tin-oxide thin films. Thin Solid Films 359, 61.
28. Muranaka, S. (1991) Crystallization of amorphous In2O3 films during film growth. Japanese Journal of Applied Physics Part 2 30(12A), L2062.
29. Muranaka, S., Bando, Y. and Takada, T. (1987) Influence of substrate temperature and film thickness on the structure of reactively evaporated In2O3 films. Thin Solid Films 151, 355-364.
30. 2 films and powders, Journal of Applied Physics 89, 8022.
31. Oyama, T. (1992) Structure of deposited ITO. Journal of Vacuum Science and Technology A 10, 1682.
32. Paine, D. C., Whitson, T., Janiac, D., Beresford, R., Yang, C. O. and Lewis, B. (1999) A study of low temperature crystallization of amorphous thin film indium-tin-oxide. Journal of Applied Physics 85(12), 8445-8450.
33. Phillips, J., Cava, R., Thomas, G., Carter, S. A., Kwo, J., Siegrist, T., Krajewski, J. J., Marshall, J. H., Peck, W. F. and Rapkine, D. (1995) Zinc-indium-oxide: a high conductivity transparent conducting oxide. Applied Physics Letters 67(15), 2246-2248.
34. Phillips, J. M., Kwo, J., Thomas, G. A., Carter, S. A., Cava, R. J., Hou, S. Y., Krajewski, J. J. and van Dover, R. B. (1994) Transparent conducting thin-films of GaInO3. Applied Physics Letters 65, 115-117.
35. Sheats, J. R. (2002) Roll-to-roll manufacturing of thin film electronics. SPIE Proceedings 4688.
36. Shigesato, Y. and Paine, D. C. (1994) A microstructural study of low resistivity tin-doped indium oxide prepared by d. c. magnetron sputtering. Thin Solid Films 238, 73.
37. Shigesato,Y., Takaki, S. and Haranoh, T. (1992) Electrical and structural properties of low resistivity tin-doped indium oxide films. Journal of Applied Physics 71, 3356.
38. Song, P. K. (1998) Study on crystallinity of tin-doped oxide films deposited by DC magnetron sputtering. Japanese Journal of Applied Physics part 1 37(4A), 1870-1876.
39. Stauber, R. E., Perkins, J. D., Parilla, P. A. and Ginley, D. S. (1999) Thin film growth of transparent ptype CuAlO2. Electrochemistry Solid State Letters 2, 654.
40. Un'no, H., Hikuma, N., Omata, T., Ueda, N., Hashimoto, T. and Kawazoe, H. (2002) Carrier generation in MgIn2O4 thin films. Philosophical Magazine B 82, 1155.
41. Vink, T. J.,Walrave,W., Daams, J. L. C, Baarslag, P. C. and van der Meerakker, J. E. A. M. (1995) On the homogeneity of sputter deposited ITO film. Part 1: Stress and mictrostructure. Thin Solid Films 266, 145.
42. Yaglioglu, B., Yeom, H. Y., Chason, E. and Paine, D. C. (2003) A structural study of the amorphous to crystalline transformation in In2O3 thin films. Material Research Society Symposium Proceedings 747, 347-352.
43. Yi, C. H. (1995) Microstructure of low-resistivity tin-doped indium oxide films deposited at 150-200 °C. Japanese Journal of Applied Physics Part 2 34(2B), 244-247.