Diffusion-reaction model of ALD in nanostructured substrates: Analytic approximations to dose times as a function of the surface reaction probability

ECS Transactions

Volumn 41, Issue 2, 2011, Pages 169-174

  Yanguas Gil, A ^a   Elam, J W ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ATOMS; INTEGRAL EQUATIONS; SUBSTRATES; SURFACE REACTIONS;

ADVECTION-DIFFUSION-REACTION EQUATIONS; ANALYTIC APPROXIMATION; DIFFUSION-REACTION MODEL; EXPERIMENTAL CONDITIONS; NANOSTRUCTURED SUBSTRATES; REACTION PROBABILITY; SUBSTRATE GEOMETRY; TRANSPORT MODELING;

ATOMIC LAYER DEPOSITION;

EID: 84857274796     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3633665     Document Type: Conference Paper

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