Carbon nanowalls deposited by inductively coupled plasma enhanced chemical vapor deposition using aluminum acetylacetonate as precursor

Carbon

Volumn 49, Issue 15, 2011, Pages 4987-4995

  Jain, Himani Gaur ^a   Karacuban, Hatice ^a   Krix, David ^a   Becker, Hans Werner ^b   Nienhaus, Hermann ^a   Buck, Volker ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

^b RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ARGON; DEPOSITION; INDUCTIVELY COUPLED PLASMA; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES; VAPOR DEPOSITION;

ALUMINUM ACETYLACETONATE; CARBON NANOWALLS; CONTINUOUS FLOWS; DEPOSITION PARAMETERS; LATERAL SIZES; STEEL SUBSTRATE; SUBSTRATE MATERIAL; SUBSTRATE TEMPERATURE;

ALUMINUM COATINGS;

EID: 84857032626     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2011.07.002     Document Type: Article

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