Freestanding carbon nanowalls by microwave plasma-enhanced chemical vapour deposition

Diamond and Related Materials

Volumn 15, Issue 4-8, 2006, Pages 1103-1106

  Chuang, Alfred T H ^a   Boskovic, Bojan O ^b   Robertson, John ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b Department of Materials Science and Metallurgy ^*  (United Kingdom)

Author keywords

Graphite; Microwave plasma enhanced CVD; Morphology; Nanostructures; Surface area

Indexed keywords

CARBON; CATALYSTS; GROWTH (MATERIALS); MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS;

GAS MIXTURE; MICROWAVE PLASMA-ENHANCED CVD; NANOSTRUCTURES; SURFACE AREA;

NANOSTRUCTURED MATERIALS;

EID: 33745452570     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.11.004     Document Type: Article

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