DC plasma enhanced growth of oriented carbon nanowall films by HFCVD

Diamond and Related Materials

Volumn 16, Issue 4-7 SPEC. ISS., 2007, Pages 1240-1243

  Dikonimos, Th ^a   Giorgi, L ^a   Giorgi, R ^a   Lisi, N ^a   Salernitano, E ^a   Rossi, R ^b  

^a ENEA C R CASACCIA   (Italy)

^b Centro Ricerche Brindisi   (Italy)

Author keywords

Bias growth; Hot filament CVD; Nanostructure; Plasma CVD

Indexed keywords

CARBON; CURRENT DENSITY; FILM GROWTH; FILM THICKNESS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

CARBON NANOWALLS (CNW); FILM MORPHOLOGY; GRAPHITIC CARBON STRUCTURES; HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD); PLASMA VOLTAGE;

NANOSTRUCTURES;

EID: 34047263969     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2006.11.073     Document Type: Article

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