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Volumn 11, Issue 9, 2011, Pages 8198-8201
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Decomposition schemes of copper(I) N,N′-diisopropylacetamidinate during chemical vapor deposition of copper
a b a b |
Author keywords
Copper film; Copper(I) amidinate; Gas phase composition; Mass spectrometry; MOCVD; Thermal decomposition mechanism
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Indexed keywords
COLD WALL;
COPPER FILMS;
CVD PROCESS;
CVD REACTORS;
DECOMPOSITION MECHANISM;
DECOMPOSITION SCHEME;
GAS PHASE COMPOSITION;
GASPHASE;
HALOGEN-FREE COMPOUNDS;
HOT WALL;
IN-VACUUM;
LOW PRESSURES;
PROTONATED;
PURE COPPER;
SUBATMOSPHERIC PRESSURES;
THERMAL DECOMPOSITION MECHANISM;
CHEMICAL VAPOR DEPOSITION;
GASES;
HYDROGEN;
MASS SPECTROMETRY;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
PROPYLENE;
PYROLYSIS;
VACUUM;
COPPER;
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EID: 84856845227
PISSN: 15334880
EISSN: None
Source Type: Journal
DOI: 10.1166/jnn.2011.5099 Document Type: Conference Paper |
Times cited : (12)
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References (18)
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