Mass spectrometry as a tool to study MOCVD process

ECS Transactions

Volumn 25, Issue 8 PART 2, 2009, Pages 1301-1308

  Turgambaeva, A E ^a,b   Krisyuk, V V ^a,b   Prud'homme, N ^a   Vahlas, C ^a  

^a INSTITUT CARNOT CIRIMAT   (France)

^b NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

COLD WALL; CVD PROCESS; CVD REACTORS; GAS PHASE COMPOSITION; GASPHASE; HOT WALL; IN-SITU; METAL FILM; MOCVD; ORGANOMETALLIC PRECURSORS; SAMPLING EFFECTS; TEMPERATURE CONDITIONS; THERMAL DECOMPOSITION MECHANISM;

GASES; MASS SPECTROMETERS; MASS SPECTROMETRY; ORGANOMETALLICS; PHASE COMPOSITION; PRESSURE EFFECTS; PYROLYSIS; WALLS (STRUCTURAL PARTITIONS);

CHEMICAL VAPOR DEPOSITION;

EID: 76549117964     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3207736     Document Type: Conference Paper

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