SCOPUS 정보 검색 플랫폼

Journal of Materials Science: Materials in Electronics

Volumn 23, Issue 2, 2012, Pages 589-594

Influence of oxygen flow rate on photocatalytic TiO 2 films deposited by rf magnetron sputtering

(6) Chiou, A H a Kuo, C G b Huang, C H c Wu, W F d Chou, C P a Hsu, C Y c

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

b NATIONAL TAIWAN NORMAL UNIVERSITY (Taiwan)

c LUNGHWA UNIVERSITY OF SCIENCE AND TECHNOLOGY (Taiwan)

d NATIONAL NANO DEVICE LABORATORIES (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS STRUCTURES; CERAMIC TARGET; GLASS SUBSTRATES; INFLUENCE OF OXYGEN; METHYLENE BLUE; OXYGEN PARTIAL PRESSURE; PHOTO-CATALYTIC; PHOTO-INDUCED DECOMPOSITION; PHOTOCATALYTIC ACTIVITIES; PHOTOINDUCED HYDROPHILICITY; RF-MAGNETRON SPUTTERING; SOLUTION DECOMPOSITION; SUBSTRATE TEMPERATURE; TIO; TOTAL GAS PRESSURE; UV ILLUMINATIONS; UV IRRADIATION; UV-LIGHT ILLUMINATION; WATER CONTACT ANGLE; XRD PATTERNS;

CONTACT ANGLE; FLOW RATE; HYDROPHILICITY; MAGNETRON SPUTTERING; PARTIAL PRESSURE; PHOTOCATALYSIS; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION;

TITANIUM DIOXIDE;

EID: 84856745983 PISSN: 09574522 EISSN: 1573482X Source Type: Journal
DOI: 10.1007/s10854-011-0445-3 Document Type: Article

Times cited : (9)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.