Control of interface nanoscale structure created by plasma-enhanced chemical vapor deposition

ACS Applied Materials and Interfaces

Volumn 3, Issue 9, 2011, Pages 3375-3383

  Peri, Someswara R ^a   Akgun, Bulent ^b,c   Satija, Sushil K ^b   Jiang, Hao ^d   Enlow, Jesse ^d   Bunning, Timothy J ^d   Foster, Mark D ^a  

^a UNIVERSITY OF AKRON   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^c UNIVERSITY OF MARYLAND   (United States)

^d AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

cross link density; PECVD interfaces; PECVD process parameters; plasma polymerization; vapor swelling; X ray neutron reflectivity

Indexed keywords

AIR INTERFACE; CHEMICAL COMPOSITIONS; CROSS-LINK DENSITIES; DEPOSITION PARAMETERS; DEPTH-RESOLVED; FEED POSITION; FLUORINE CONTENT; INTERFACE STRUCTURES; NANO SCALE; NANOSCALE STRUCTURE; PLASMA POWER; PROCESSING CONDITION; RICH PICTURE; STRUCTURE OF FILMS; SUBSTRATE INTERFACE; SURFACE LAYERS; TRANSITION REGIONS; VAPOR-SWELLING; X-RAY AND NEUTRON REFLECTIVITY; X-RAY/NEUTRON REFLECTIVITY;

CHEMICAL CONTAMINATION; CHEMICAL VAPOR DEPOSITION; FLUORINE; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA POLYMERIZATION; PLASMAS; REFLECTION;

PLASMA DEPOSITION;

CHLOROFLUOROCARBON; FLUORINE; NANOMATERIAL; OCTAFLUOROCYCLOBUTANE; POLYMER;

ARTICLE; CHEMISTRY; GAS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHLOROFLUOROCARBONS, METHANE; FLUORINE; GASES; NANOSTRUCTURES; PHOTOELECTRON SPECTROSCOPY; POLYMERS;

EID: 84856461620     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am200543x     Document Type: Article

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