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Thin Solid Films

Volumn 520, Issue 7, 2012, Pages 2461-2466

Electron back-scattered diffraction of crystallized vanadium dioxide thin films on amorphous silicon dioxide

(4) Rivera, Felipe a Burk, Laurel b Davis, Robert a Vanfleet, Richard a

a Brigham Young University (United States)

b UNIVERSITY OF NEBRASKA LINCOLN (United States)

Author keywords

Electron Backscattering Diffraction; Orientation imaging microscopy; Texture; Vanadium dioxide

Indexed keywords

ANNEALING PROCESS; CRYSTALLINE FILMS; CRYSTALLIZATION PROCESS; EBSD PATTERN; ELECTRON BACK-SCATTERED DIFFRACTION; ELECTRON BACKSCATTERING DIFFRACTION; ORIENTATION IMAGING MICROSCOPY; ORIENTATION MAPS; PREFERRED ORIENTATIONS; SEMI-CONTINUOUS; SOLID PHASE CRYSTALLIZATION; TETRAGONAL PHASE; TETRAGONAL PHASIS; THICKNESS OF THE FILM; VANADIUM DIOXIDE; VANADIUM DIOXIDE THIN FILMS; VANADIUM OXIDE THIN FILMS; VANADIUM OXIDES;

AMORPHOUS FILMS; BACKSCATTERING; CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; CRYSTALS; DIFFRACTION; INDEXING (OF INFORMATION); OXIDE FILMS; OXIDES; SEMICONDUCTING SILICON COMPOUNDS; SILICA; STOICHIOMETRY; TEXTURES; THIN FILMS; VANADIUM; VANADIUM COMPOUNDS;

AMORPHOUS SILICON;

EID: 84856407351 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.10.014 Document Type: Article

Times cited : (3)

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