Effect of hot-filament annealing in a hydrogen atmosphere on the electrical and structural properties of Nb-doped TiO 2 sputtered thin films

Thin Solid Films

Volumn 520, Issue 7, 2012, Pages 2514-2519

  Tavares, C J ^a   Castro, M V ^a   Marins, E S ^a   Samantilleke, A P ^a   Ferdov, S ^a   Rebouta, L ^a   Benelmekki, M ^a   Cerqueira, M F ^a   Alpuim, P ^a   Xuriguera, E ^b   Riviere J P ^c   Eyidi, D ^c   Beaufort, M F ^c   Mendes, A ^d  

^a UNIVERSITY OF MINHO   (Portugal)

^b UNIVERSITY OF BARCELONA   (Spain)

^c UNIVERSITÉ DE POITIERS   (France)

^d UNIVERSITY OF PORTO   (Portugal)

Author keywords

Electrical properties; Hot wire; Nb doping; Reactive sputtering; TCO; Titanium dioxide

Indexed keywords

ATOMIC HYDROGEN; CHEMICAL VAPOUR DEPOSITION; COMPOSITE TARGET; CONDUCTIVE PROPERTIES; CONTACT LAYERS; DARK CONDUCTIVITY; ELECTRICAL AND STRUCTURAL PROPERTIES; HALL EFFECT MEASUREMENT; HIGH VACUUM; HOT-FILAMENT; HOT-WIRE; HYDROGEN ANNEALING; HYDROGEN ATMOSPHERE; HYDROGEN PRESSURES; HYDROGEN TREATMENTS; IN-VACUUM; NB DOPING; PHOTOVOLTAICS; REACTIVE GAS; REACTIVE MAGNETRON SPUTTERING; ROOM TEMPERATURE; SPUTTERED THIN FILMS; STRUCTURAL AND ELECTRICAL PROPERTIES; SUBSTRATE TEMPERATURE; TANDEM SOLAR CELLS; TCO; TIO; TIO2 THIN FILMS; TREATMENT TIME; WEIGHT FRACTIONS;

ATOMS; CARRIER MOBILITY; CHEMICAL VAPOR DEPOSITION; COMPOSITE FILMS; CONDUCTIVE FILMS; HALL EFFECT; HALL MOBILITY; HYDROGEN; NIOBIUM; OXIDES; OXYGEN; OXYGEN VACANCIES; REACTIVE SPUTTERING; REFRACTIVE INDEX; SEMICONDUCTOR DOPING; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; TRANSPORT PROPERTIES; VACUUM; WIRE;

ELECTRIC PROPERTIES;

EID: 84856390740     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.10.031     Document Type: Article

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