Hydrogenated amorphous and nanocrystalline silicon solar cells deposited by HWCVD and RF-PECVD on plastic substrates at 150 °C

Journal of Non-Crystalline Solids

Volumn 354, Issue 19-25, 2008, Pages 2376-2380

  Filonovich, S A ^a   Alpuim, P ^a   Rebouta, L ^a   Bouree J E ^b   Soro, Y M ^c  

^a UNIVERSITY OF MINHO   (Portugal)

^b LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^c UNIV PARIS SUD   (France)

Author keywords

Chemical vapor deposition; Conductivity; Photoconductivity; Photovoltaics; Silicon; Solar cells

Indexed keywords

AMORPHOUS SILICON; NANOCRYSTALLINE SILICON; PHOTOCONDUCTIVITY; PHOTOVOLTAIC CELLS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TRANSPORT PROPERTIES;

DEPOSITION PRESSURE; HOT-WIRE CHEMICAL VAPOR DEPOSITION (HWCVD); POLYMORPHOUS SILICON FILMS;

SOLAR CELLS;

EID: 42649094159     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2007.09.030     Document Type: Article

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