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Volumn 714, Issue , 2012, Pages 1-7

Endogenous and exogenous hydrogen influence on amorphous silicon thin films analysis by pulsed radiofrequency glow discharge optical emission spectrometry

Author keywords

Gas mixture argon hydrogen; Hydrogenated amorphous silicon; Optical emission spectrometry; Pulsed radiofrequency glow discharge; Thin film solar cells

Indexed keywords

A-SI:H; AMORPHOUS SILICON THIN FILMS; ARGON DISCHARGES; CONDUCTING MATERIALS; DEPTH RESOLUTION; DUTY CYCLES; EMISSION INTENSITY; ENHANCED EMISSION; HYDROGENATED AMORPHOUS SILICON (A-SI:H); OPTICAL EMISSION SPECTROMETRY; OPTIMISATIONS; OPTIMUM CONDITIONS; P-DOPED LAYERS; PENETRATION RATES; PHOTOVOLTAIC INDUSTRY; PRODUCTION COST; PULSE FREQUENCIES; PULSE PARAMETER; PULSED RADIOFREQUENCY GLOW DISCHARGE; RADIOFREQUENCY GLOW DISCHARGES; SPUTTERING RATE; THIN FILM SOLAR CELLS;

EID: 84855685695     PISSN: 00032670     EISSN: 18734324     Source Type: Journal    
DOI: 10.1016/j.aca.2011.11.052     Document Type: Article
Times cited : (8)

References (26)
  • 6
    • 84855681599 scopus 로고    scopus 로고
    • Glow Discharge Optical Emission Spectroscopy: A Practical Guide, RSC Analytical Spectroscopy Monographs, Cambridge, UK
    • Th. Nelis, R. Payling, Glow Discharge Optical Emission Spectroscopy: A Practical Guide, RSC Analytical Spectroscopy Monographs, Cambridge, UK, 2003.
    • (2003)
    • Nelis, T.1    Payling, R.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.