A promising routine to fabricate GeSi nanowires via self-assembly on miscut Si (001) substrates

Nanoscale Research Letters

Volumn 6, Issue 1, 2011, Pages

  Zhong, Zhenyang ^a   Gong, Hua ^a   Ma, Yingjie ^a   Fan, Yongliang ^a   Jiang, Zuimin ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FABRICATION; GERMANIUM; NANOWIRES; SELF ASSEMBLY; SILICON;

FUNDAMENTAL STUDIES; GROWTH CONDITIONS; MISCUT ANGLE; MISCUT DIRECTION; SI (001) SUBSTRATE; SI MATRIX; SI TECHNOLOGY; VICINAL SI(001) SUBSTRATE;

SI-GE ALLOYS;

EID: 84255182759     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-6-322     Document Type: Article

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