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Volumn 20, Issue 3, 2009, Pages
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The preparation of superhydrophobic surfaces of hierarchical silicon nanowire structures
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Author keywords
[No Author keywords available]
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Indexed keywords
CONTACT ANGLE;
ELECTRIC WIRE;
HYDROPHOBICITY;
NANOWIRES;
SEMICONDUCTING SILICON COMPOUNDS;
SILANES;
SURFACE CHEMISTRY;
SURFACE PROPERTIES;
SURFACE ROUGHNESS;
SURFACE TENSION;
CASSIE STATES;
CHEMICAL NATURES;
DYNAMIC CONTACT ANGLE S;
ETCHING TIMES;
HIERARCHICAL STRUCTURES;
NANO PILLARS;
NEAR ROOM TEMPERATURES;
OCTADECYLTRICHLOROSILANE MONOLAYERS;
SILICON NANOWIRES;
SUPER HYDROPHOBICITIES;
SUPERHYDROPHOBIC SURFACES;
SURFACE ENERGIES;
WATER DROPLETS;
WENZEL STATES;
SILICON WAFERS;
NANOCOMPOSITE;
NANOFIBER;
NANOTUBE;
ARTICLE;
ATOMIC LAYER DEPOSITION;
CHEMICAL PROCEDURES;
ELECTRON SPIN RESONANCE;
MAGNET;
MAGNETIC FIELD;
PHOTOCATALYSIS;
PRIORITY JOURNAL;
RECYCLING;
SYNTHESIS;
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EID: 58149214060
PISSN: 09574484
EISSN: 13616528
Source Type: Journal
DOI: 10.1088/0957-4484/20/3/035605 Document Type: Article |
Times cited : (49)
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References (40)
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