Oxidation of alkylsilane-based monolayers on gold

Langmuir

Volumn 20, Issue 22, 2004, Pages 9636-9645

  Owens, Thomas M ^a   Ludwig, Bonnie J ^a   Schneider, Kevin S ^a   Fosnacht, Daniel R ^a   Orr, Bradford G ^a   Banaszak Holl, Mark M ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC SENSITIVITY; NANOPARTICLES; SILOXANE POLYMERS;

ANNEALING; ELECTRIC DISCHARGES; GOLD; LIGHT SOURCES; NANOSTRUCTURED MATERIALS; OXIDATION; RAMAN SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

MONOLAYERS;

ELECTRIC DISCHARGE; GOLD; LIGHT SOURCES; MONOLAYERS; OXIDATION;

EID: 8344273644     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la0496385     Document Type: Article

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