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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 5, 2004, Pages 2195-2200

13.56 MHz radio frequency plasma properties on hemispheric electrodes and diamond-like carbon films deposition on three-dimensional polyurethane diaphragms

(2) Ohgoe, Yasuharu a Hirakuri, Kenji K a

a TOKYO DENKI UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; DIAMONDS; ELECTRIC INSULATORS; LANGMUIR BLODGETT FILMS; MAGNETIC FIELD MEASUREMENT; POLYURETHANES; SILICON WAFERS; TEMPERATURE MEASUREMENT; THIN FILMS;

CARBON FILMS; FILM DEPOSITION; HEMISPHERIC ELECTRODES; RADIO FREQUENCY (RF);

PLASMAS;

EID: 8344241958 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1786306 Document Type: Article

Times cited : (10)

References (16)

1
- 0037946704
- A. Descoeudres, L. Sansonnens, and Ch. Hollenstein, Plasma Sources Sci. Technol. 12, 152 (2003).
- (2003) Plasma Sources Sci. Technol. , vol.12 , pp. 152
- Descoeudres, A.¹ Sansonnens, L.² Hollenstein, Ch.³

2
- 0029195844
- K. K. Hirakuri, N. Mutsukura, and Y. Machi, Vacuum 46, 57 (1995).
- (1995) Vacuum , vol.46 , pp. 57
- Hirakuri, K.K.¹ Mutsukura, N.² Machi, Y.³

3
- 0025791024
- K. Kobayashi, N. Mutsukura, and Y. Machi, Vacuum 42, 741 (1991).
- (1991) Vacuum , vol.42 , pp. 741
- Kobayashi, K.¹ Mutsukura, N.² Machi, Y.³

4
- 0035248156
- V.-M. Tiainen, Diamond Relat. Mater. 10, 153 (2001).
- (2001) Diamond Relat. Mater. , vol.10 , pp. 153
- Tiainen, V.-M.¹

5
- 21544483271
- M. A. Tamor, W. C. Vassell, and K. R. Carduner, Appl. Phys. Lett. 58, 592 (1991).
- (1991) Appl. Phys. Lett. , vol.58 , pp. 592
- Tamor, M.A.¹ Vassell, W.C.² Carduner, K.R.³

6
- 0037308460
- C. Hopf, A. von Keudell, and W. Jacob, Diamond Relat. Mater. 12, 85 (2003).
- (2003) Diamond Relat. Mater. , vol.12 , pp. 85
- Hopf, C.¹ Von Keudell, A.² Jacob, W.³

7
- 10744226850
- Y. Ohgoe et al., ASAIO J. 49, 701 (2003).
- (2003) ASAIO J. , vol.49 , pp. 701
- Ohgoe, Y.¹

8
- 2642545651
- Y. Ohgoe, K. K. Hirakuri, K. Tsuchimoto, G. Friedbacher, and O. Miyashita, Surf. Coat. Technol. 184, 263 (2004).
- (2004) Surf. Coat. Technol. , vol.184 , pp. 263
- Ohgoe, Y.¹ Hirakuri, K.K.² Tsuchimoto, K.³ Friedbacher, G.⁴ Miyashita, O.⁵

9
- 0032027332
- Y. Taki and O. Takai, Thin Solid Films 316, 45 (1998).
- (1998) Thin Solid Films , vol.316 , pp. 45
- Taki, Y.¹ Takai, O.²

10
- 0008084852
- K. Endo, T. Miyamura, N. Kitaori, and O. Yoshida, Jpn. J. Appl. Phys., Part 1 37, 3486 (1998).
- (1998) Jpn. J. Appl. Phys., Part 1 , vol.37 , pp. 3486
- Endo, K.¹ Miyamura, T.² Kitaori, N.³ Yoshida, O.⁴

11
- 0031163498
- K. K. Hirakuri, T. Minorikawa, G. Friedbacher, and M. Grasserbauer, Thin Solid Films 302, 5 (1997).
- (1997) Thin Solid Films , vol.302 , pp. 5
- Hirakuri, K.K.¹ Minorikawa, T.² Friedbacher, G.³ Grasserbauer, M.⁴

12
- 11344277892
- N. Mutsukura, S.-I. Inoue, and Y. Machi, J. Appl. Phys. 72, 43 (1992).
- (1992) J. Appl. Phys. , vol.72 , pp. 43
- Mutsukura, N.¹ Inoue, S.-I.² Machi, Y.³

13
- 0036861411
- D. Boonyawan, N. Chiraphatpimol, and T. Vilaithong, Plasma Sources Sci. Technol. 11, 389 (2002).
- (2002) Plasma Sources Sci. Technol. , vol.11 , pp. 389
- Boonyawan, D.¹ Chiraphatpimol, N.² Vilaithong, T.³

14
- 0030205107
- J. Menard and T. Intrator, Plasma Sources Sci. Technol. 5, 363 (1996).
- (1996) Plasma Sources Sci. Technol. , vol.5 , pp. 363
- Menard, J.¹ Intrator, T.²

15
- 0030282986
- K. Nagayama, B. Farouk, and Y. H. Lee, Plasma Sources Sci. Technol. 5, 685 (1996).
- (1996) Plasma Sources Sci. Technol. , vol.5 , pp. 685
- Nagayama, K.¹ Farouk, B.² Lee, Y.H.³

16
- 0242603790
- A. C. Ferrari and J. Robertson, Phys. Rev. B 61, 14095 (2000).
- (2000) Phys. Rev. B , vol.61 , pp. 14095
- Ferrari, A.C.¹ Robertson, J.²

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