Chemical vapor deposition boron carbo-nitride deposited using dimethylamine borane with ammonia and ethylene

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 5, 2004, Pages 2152-2158

  Engbrecht, E R ^a   Sun, Y M ^b   Junker, K H ^c   White, J M ^b   Ekerdt, J G ^a  

^a The University of Texas at Austin   (United States)

^b University of Texas at Austin   (United States)

^c FREESCALE SEMICONDUCTOR INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BORON CARBO-NITRIDE FILMS; COREACTANTS; FILM COMPOSITION; FLOW OF AMMONIA;

AMMONIA; AMORPHOUS FILMS; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; COMPOSITION; ETHYLENE; NITRIDES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

BORON CARBIDE;

EID: 8344224488     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1778405     Document Type: Article

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