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Journal of Applied Electrochemistry

Volumn 41, Issue 11, 2011, Pages 1329-1340

Characterization of the performance and failure mechanisms of boron-doped ultrananocrystalline diamond electrodes

(5) Chaplin, Brian P a Wyle, Ian b Zeng, Hongjun b Carlisle, John A b Farrell, James c

a Villanova University (United States)

b ADVANCED DIAMOND TECHNOLOGIES INC (United States)

c University of Arizona (United States)

Author keywords

Diamond film; Electrode wear; Trichloroethylene; Ultrananocrystalline

Indexed keywords

ANODIC TREATMENT; BORON-DOPED; ELECTRO-ACTIVITY; ELECTRODE WEAR; FAILURE MECHANISM; FILM ADHESION; FILM DELAMINATION; FILM ELECTRODES; KEY PARAMETERS; METAL SUBSTRATE; PRIMARY MECHANISM; SUBSTRATE MATERIAL; SUBSTRATE ROUGHNESS; SURFACE OXIDATIONS; ULTRA-NANOCRYSTALLINE DIAMOND; ULTRANANOCRYSTALLINE;

ADHESION; ANODIC OXIDATION; BORON; DELAMINATION; DIAMOND FILMS; DIAMONDS; ELECTROCHEMICAL PROPERTIES; NIOBIUM; STEEL SHEET; SUBSTRATES; TANTALUM; THERMAL EXPANSION; TRICHLOROETHYLENE;

ELECTROCHEMICAL ELECTRODES;

EID: 83155192161 PISSN: 0021891X EISSN: None Source Type: Journal
DOI: 10.1007/s10800-011-0351-7 Document Type: Article

Times cited : (58)

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