Comparison of the chemical composition of boron-doped diamond surfaces upon different oxidation processes

Electrochimica Acta

Volumn 54, Issue 24, 2009, Pages 5818-5824

  Wang, Mei ^a,b   Simon, Nathalie ^c   Decorse Pascanut, Claudia ^c   Bouttemy, Muriel ^c   Etcheberry, Arnaud ^c   Li, Musen ^b   Boukherroub, Rabah ^a   Szunerits, Sabine ^a  

^a INSTITUT D ELECTRONIQUE   (France)

^b SHANDONG UNIVERSITY   (China)

^c UNIVERSITÉ DE VERSAILLES SAINT QUENTIN EN YVELINES   (France)

Author keywords

Diamond; Mott Schottky; Oxidation; Surface chemistry; XPS

Indexed keywords

BORON; CHEMICAL BONDS; CYCLIC VOLTAMMETRY; DIAMONDS; OXIDATION; SURFACE CHEMISTRY;

BORON DOPED DIAMOND; C-V MEASUREMENT; CHEMICAL COMPOSITIONS; DIAMOND SURFACES; MOTT-SCHOTTKY; OXIDATION PROCESS; POLYCRYSTALLINE DIAMONDS; SURFACE FUNCTIONALIZATION;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 67649538259     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2009.05.037     Document Type: Article

References (26)

1. Nebel C.E., Shin D., Rezek B., Tokuda N., Uetsuka H., and Watanabe H. J. R. Soc. Interface 4 (2007) 439
2. Werner M., Krotz G., Moller H., Eickhoff M., Gluche P., Adamschik M., Johnston C., and Chalker P.R. Sens. Update 5 (2001) 141
3. Szunerits S., and Boukherroub R. J. Solid State Electrochem. 12 (2008) 1205
4. Ando T., Yamamoto K., Ishii M., Kamo M., and Sato Y. J. Chem. Soc., Faraday Trans. 89 (1993) 3635
5. Pehrsson P.E., and Mercer T.W. Surf. Sci. 460 (2000) 49
6. John P., Polwart N., Troupe C.E., and Wilson J.I.B. J. Am. Chem. Soc. 125 (2003) 6600
7. Notsu H., Yagi I., Tatsuma T., Tryk D.A., and Fujishima A. Electrochem. Solid-State Lett. 2 (1999) 522
8. Yagi I., Notsu H., Kondo T., Tryk D.A., and Fujishima A. J. Electroanal. Chem. 473 (1999) 173
9. Boukherroub R., Wallart X., Szunerits S., Marcus B., Bouvier P., and Mermoux M. Electrochem. Commun. 7 (2005) 937
10. Kanazawa H., Song K.-S., Sakai T., Nakamura Y., Umezawa H., Tachiki M., and Kawarada H. Diam. Relat. Mater. 12 (2003) 618
11. Riedel M., Ristein J., and Ley L. Diam. Relat. Mater. 13 (2004) 746
12. Delabouglise D., Marcus B., Mermoux M., Bouvier P., Chane-Tune J., Petit J.-P., Mailley P., and Livache T. Chem. Commun. (2003) 2698
13. Goeting C.H., Marken F., Gutiérrez-Sosa A., and Compton R.C. Diam. Relat. Mater. 9 (2000) 390
14. Notsu H., Yagi I., Tatsuma T., Tryk D.A., and Fujishima A. J. Electroanal. Chem. 492 (2000) 31
15. Popa E., Notsu H., Miwa T., Tryk D.A., and Fujishima A. Electrochem. Solid State Lett. 2 (1999) 49
16. Ando T., Tanaka A., Ishihara M., Kamo M., Sato Y., Ohashi N., and Shimosaki S. J. Chem. Soc., Faraday Trans. 89 (1993) 3105
17. Girard H.A., Simon N., Ballutaud D., Herlem M., and Etcheberry A. Diam. Relat. Mater. 16 (2007) 316
18. Simon N., Girard H., Ballutaud D., Ghodbane S., Deneuville A., Herlem M., and Etcheberry A. Diam. Relat. Mater. 14 (2005) 1179
19. Girard H., Rochefoucauld E., Ballutaud D., Etcheberry A., and Simon N. Electrochem. Solid State Lett. 10 (2007) F34
20. Girard H., Simon N., Ballutaud D., Rochefoucauld E., and Etcheberry A. Diam. Relat. Mater. 16 (2007) 888
21. Szunerits S., Shirahata N., Actis P., Nakanishir J., and Boukherroub R. Chem. Commun. (2007) 2793
22. Zhang G.-J., Song K.-S., Nakamura Y., Ueno T., Funatsu T., Ohdomari I., and Kawarada H. Langmuir 22 (2006) 3728
23. Pleskov Y.V., Evstefeeva Y.E., Varnin V.P., and Teremetskaya I.G. Russ. J. Electrochem. 40 (2004) 886
24. Alehashem S., Chambers F., Strojek J.W., Swain G.M., and Ramesham R. Anal. Chem. 67 (1995) 2812
25. Boonma L., Yano T., Tryk D.A., Hashimoto K., and Fujishima A. J. Electrochem. Soc. 144 (1997) L142
26. Tryk D.A., Tsunozaki K., Rao T.N., and Fujishima A. Diam. Relat. Mater. 10 (2001) 1804