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Japanese Journal of Applied Physics

Volumn 50, Issue 12, 2011, Pages

Pulsed electron deposition of 50-nm-thick ZnO film at room temperature

(6) Rho, Jaehoon a Yu, Kwangnam a Jeong, Rok Hwan a Park, J H b Chung, J S b Choi, Eunjip a

a University of Seoul (South Korea)

b Soongsil University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY BANDGAPS; GROWTH CHAMBER; LOW TEMPERATURES; OPTICAL PHONON FREQUENCIES; OXYGEN PARTIAL PRESSURE; PULSED ELECTRON DEPOSITION; ROOM TEMPERATURE; SI SUBSTRATES; TRANSMISSION DATA; VISIBLE-UV; ZNO; ZNO FILMS; ZNO THIN FILM;

DEPOSITION; ELECTRON SOURCES; METALLIC FILMS; OPTICAL PROPERTIES; QUARTZ; SEMICONDUCTING SILICON COMPOUNDS; SINGLE CRYSTALS; X RAY DIFFRACTION;

ZINC OXIDE;

EID: 82955227991 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.50.120209 Document Type: Article

Times cited : (4)

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