Investigations of diffusion behaviour in Al-doped zinc oxide and zinc stannate coatings

Thin Solid Films

Volumn 520, Issue 5, 2011, Pages 1368-1374

  Kulczyk Malecka, J ^a   Kelly, P J ^a   West, G ^a   Clarke, G C B ^b   Ridealgh, J A ^b  

^a MANCHESTER METROPOLITAN UNIVERSITY   (United Kingdom)

^b Pilkington Group Limited   (United Kingdom)

Author keywords

Al doped ZnO; Diffusion; Magnetron sputtering; Zinc stannate

Indexed keywords

AL-DOPED ZINC OXIDE; AL-DOPED ZNO; ANTI-REFLECTANCE; ATOMIC FORCE MICROSCOPES; COATING SYSTEM; DC MODE; DIELECTRIC COATINGS; DIELECTRIC LAYER; DIFFUSION COEFFICIENTS; DIFFUSION RATE; ELECTRICAL CONDUCTIVITY; ENERGY REFLECTION; FAR-INFRARED REGIONS; LONG-WAVELENGTH IR; METALLIC TARGETS; MID-FREQUENCY; MULTILAYER DIELECTRICS; OPERATING PRESSURE; OXIDE COATING; OXIDE SAMPLES; OXYGEN FLOW RATES; PROCESS VARIABLES; PROCESSING CONDITION; PULSED DC; SECONDARY ION MASS SPECTROSCOPY; SILVER LAYER; SODA LIME GLASS SUBSTRATE; SODIUM ATOM; STRUCTURAL VARIATIONS; ZINC STANNATE;

ALUMINUM; ATOMIC FORCE MICROSCOPY; DIFFUSION; DIFFUSION COATINGS; ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; OXIDE FILMS; PROTECTIVE COATINGS; REFLECTION; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SILVER; SOLAR ENERGY; SUBSTRATES; X RAY DIFFRACTION; ZINC; ZINC OXIDE;

ZINC COATINGS;

EID: 82755197727     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.08.076     Document Type: Conference Paper

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