Titanium diffusion in gold thin films

Thin Solid Films

Volumn 518, Issue 10, 2010, Pages 2585-2591

  Martinez, William E ^a   Gregori, Giuliano ^b   Mates, Thomas ^a  

^a University of California   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Diffusion; Gold; Titanium; Titanium nitride

Indexed keywords

AU THIN FILMS; DIFFUSION ACTIVATION ENERGY; DIFFUSION PHENOMENA; EFFECTIVE DIFFUSION; GOLD THIN FILMS; GRAIN BOUNDARY DIFFUSIVITY; POLYCRYSTALLINE; PREEXPONENTIAL FACTOR; SECONDARY ION MASS SPECTROSCOPY; THIN TIN; TI ATOMS; TI DIFFUSION;

ACTIVATION ENERGY; ATOMIC SPECTROSCOPY; DIFFUSION; GOLD; GRAIN BOUNDARIES; SECONDARY ION MASS SPECTROMETRY; THIN FILMS; TITANIUM;

TITANIUM NITRIDE;

EID: 76049113064     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.07.187     Document Type: Article

References (22)

1. Madou M.J. Fundamentals of Microfabrication: The Science of Miniaturization. 2nd ed. (2002), CRC Press, New York 615
2. Harrison L.G. Trans. Faraday Soc. 57 (1961) 1191
3. Tisone T.C., and Drobek J. J. Vac. Sci. Technol. 9 (1971) 271
4. Murray J.L. Bull. Alloy Phase Diag. 4 (1983) 278
5. Luo W.K., Jin Z.P., Liu H.S., and Wang T. Calphad 25 (2001) 19
6. Katz A., Murarka S.P., Nissim Y.I., and Harper J.M.E. Adva. Meta. and Proc. for Semi. Devi. and Circ. - II. Sumposium (1992) Pittsburgh, U.S.A
7. Poate M., Turner P.A., Debonte W.J., and Yahalom J. J. Appl. Phys. 46 (1975) 4275
8. Sylwestrowicz W.D., Elkholy H.A., and Kammlott G.W. J. Mater. Sci. 14 (1979) 873
9. Henry B.M., StatonBevan A.E., Sharma V.K.M., and Crouch M.A. Appl. Surf. Sci. 108 (1997) 485
10. Garceau W.J., Fournier P.R., and Herb G.K. Thin Solid Films 60 (1979) 237
11. Noël J.-P., Houhton D.C., Este G., and Shepherd F.R. J. Vac. Sci. Technol. A 2 (1984) 284287
12. Gusev A.I., and Rempel A.A. Phys. Stat. Sol. A - Appl. Res. 163 (1997) 273
13. Gao Y. J. Appl. Phys. 64 (1988) 3760
14. Whipple R.T.P. Phil. Mag. 45 (1954) 1225
15. Le Claire A.D. Brit. J. Appl. Phys. 14 (1963) 351
16. Suzuoka T.J. Trans. Jap. Inst. Metals 2 (1961) 25
17. Gibbs G.B. Phys. Stat. Sol. 16 (1966) K27
18. Kaur I., Mishin Y., and Gust W. Fundamentals of Grain and Interphase Boundary Diffusion (1995), John Wiley & Sons, Chichester, England
19. 4 . The condition is satisfied for all annealing treatments. The grain boundary thickness δ is assumed equal to 5 Å.
20. Divinski S., Ribbe J., Schmitz G., and Herzig C. Acta Mater. 55 (2007) 3337
21. Sommer J., and Herzig Chr. J. Appl. Phys. 72 (1992) 2758
22. Gas P., Beke D.L., and Bernardini J. Phil. Mag. Lett. 65 (1992) 133