Nickel diffusion in polycrystalline CuInSe2 thin films with a <112> fiber texture

Thin Solid Films

Volumn 517, Issue 9, 2009, Pages 2851-2854

  Celik, A ^a   Cevik, U ^b   Bacaksiz, E ^b   Celik, N ^b  

^a GIRESUN UNIVERSITY   (Turkey)

^b KARADENIZ TECHNICAL UNIVERSITY   (Turkey)

Author keywords

Annealing; Copper indium selinide; CuInSe2 thin films; Diffusion coefficient; Energy dispersive X ray fluorescence; Evaporation; Nickel; Thin films; Wet etching

Indexed keywords

ANNEALING; COPPER; COPPER COMPOUNDS; DIFFUSION; ENERGY DISPERSIVE SPECTROSCOPY; ETCHING; EVAPORATION; FLUORESCENCE; INDIUM; MEASUREMENT THEORY; NICKEL; NICKEL ALLOYS; SCANNING ELECTRON MICROSCOPY; SELENIUM COMPOUNDS; THIN FILM DEVICES; THIN FILMS; VAPOR DEPOSITION; VAPORS; WET ETCHING;

CONCENTRATION PROFILES; COPPER INDIUM DISELENIDE; COPPER INDIUM SELINIDE; CUINSE2; CUINSE2 THIN FILMS; DIFFUSION COEFFICIENT; ENERGY DISPERSIVE X-RAY FLUORESCENCE; ERROR FUNCTIONS; FIBER TEXTURES; GLASS SUBSTRATES; MULTI-LAYERED STRUCTURES; NICKEL CONCENTRATIONS; POLY-CRYSTALLINE; SCANNING ELECTRON MICROSCOPES; SELENIZATION; TEMPERATURE RANGES; X-RAY FLUORESCENCES;

SOLIDS;

EID: 60249086242     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.10.046     Document Type: Article

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