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Volumn 520, Issue 5, 2011, Pages 1446-1450

Nitrogen-incorporation induced changes in the microstructure of nanocrystalline WO3 thin films

Author keywords

Electrical conductivity; Microstructure; Nitrogen doping; WO3 films

Indexed keywords

CHEMICAL COMPOSITIONS; CRYSTAL QUALITIES; DC ELECTRICAL CONDUCTIVITY; DEPOSITION TEMPERATURES; ELECTRICAL CONDUCTIVITY; ELECTRICAL CONDUCTIVITY MEASUREMENTS; ELECTRICAL RESISTIVITY; GRAIN SIZE; NANOCRYSTALLINES; NITROGEN CONCENTRATIONS; NITROGEN CONTENT; NITROGEN DOPING; NITROGEN FLOW RATES; NITROGEN-DOPED; REACTIVE GAS MIXTURES; SEM ANALYSIS; TUNGSTEN OXIDE; XRD MEASUREMENTS;

EID: 82755160768     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.08.080     Document Type: Conference Paper
Times cited : (17)

References (39)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.