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Volumn 520, Issue 5, 2011, Pages 1446-1450
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Nitrogen-incorporation induced changes in the microstructure of nanocrystalline WO3 thin films
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Author keywords
Electrical conductivity; Microstructure; Nitrogen doping; WO3 films
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Indexed keywords
CHEMICAL COMPOSITIONS;
CRYSTAL QUALITIES;
DC ELECTRICAL CONDUCTIVITY;
DEPOSITION TEMPERATURES;
ELECTRICAL CONDUCTIVITY;
ELECTRICAL CONDUCTIVITY MEASUREMENTS;
ELECTRICAL RESISTIVITY;
GRAIN SIZE;
NANOCRYSTALLINES;
NITROGEN CONCENTRATIONS;
NITROGEN CONTENT;
NITROGEN DOPING;
NITROGEN FLOW RATES;
NITROGEN-DOPED;
REACTIVE GAS MIXTURES;
SEM ANALYSIS;
TUNGSTEN OXIDE;
XRD MEASUREMENTS;
CRYSTAL STRUCTURE;
ELECTRIC CONDUCTIVITY;
MAGNETRONS;
MICROSTRUCTURE;
QUALITY CONTROL;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTOR DOPING;
SURFACE STRUCTURE;
TUNGSTEN;
TUNGSTEN COMPOUNDS;
X RAY DIFFRACTION;
X RAY PHOTOELECTRON SPECTROSCOPY;
NITROGEN;
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EID: 82755160768
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2011.08.080 Document Type: Conference Paper |
Times cited : (17)
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References (39)
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