Thermal stability of HfO2 nanostructures as antireflection coatings

Nanoscience and Nanotechnology Letters

Volumn 3, Issue 5, 2011, Pages 731-734

  Ni, Jie ^a   Li, Zhengcao ^a   Zhou, Qin ^a   Zhang, Zhengjun ^a   Wei, Bingqing ^b  

^a TSINGHUA UNIVERSITY   (China)

^b UNIVERSITY OF DELAWARE   (United States)

Author keywords

Antireflection Coating; Hafnium Dioxide; Thermal Stability

Indexed keywords

ANTI-REFLECTION; HAFNIUM DIOXIDE; LINEAR RELATIONSHIPS;

COATINGS; HAFNIUM; HAFNIUM OXIDES; MORPHOLOGY; NANOSTRUCTURES; OXYGEN VACANCIES; REFRACTIVE INDEX; THERMODYNAMIC STABILITY;

ANTIREFLECTION COATINGS;

EID: 82455174226     PISSN: 19414900     EISSN: 19414919     Source Type: Journal    
DOI: 10.1166/nnl.2011.1222     Document Type: Article

References (18)

1. R. Chow, S. Falabella, G. E. Loomis, F. Rainer, C. J. Stolz, and M. R. Kozlowski, Appl. Opt. 32, 5567 (1993).
2. J. M. Khoshman and M. E. Kordesch, Surf. Coat. Technol. 201, 3530 (2006).
3. J. Ni, Y. Zhu, Q. Zhou, Z. J. Zhang, and B. Q. Wei, J. Am. Ceram. Soc. 91, 3458 (2008).
4. J. Ni, Y. Zhu, S. H. Wang, Z. C. Li, Z. J. Zhang, and B. Q. Wei, J. Am. Ceram. Soc. 92, 3077 (2009).
5. M. Takagi, J. Phys. Soc. Jpn. 9, 359 (1954).
6. H. B. Liu, J. A. Ascencio, M. P. Alvarez, and M. J. Yacaman, Surface Science 491, 88 (2001).
7. A. N. Goldstein, C. M. Echer, and A. P. Alivisatos, Science 256, 1425 (1992).
8. A. N. Goldstein, Applied Physics a-Materials Science & Processing 62, 33 (1996).
9. Q. Jiang, H. X. Shi, and M. Zhao, J. Chem. Phys. 111, 2176 (1999).
10. T. Karabacak, J. S. DeLuca, P. I. Wang, G. A. Ten Eyck, D. Ye, G. C. Wang, and T. M. Lu, J. Appl. Phys. 99, 064304 (2006).
11. C. Y. Pan, Z. J. Zhang, X. Su, Y. Zhao, and J. G. Liu, Phys. Rev. B 70, 233404 (2004).
12. Y. Y. Wu and P. D. Yang, Advanced Materials 13, 520 (2001).
13. M. W. Cross and W. J. Varhue, Nanotechnology 19, 435705 (2008).
14. X. Su, Z. J. Zhang, and M. M. Zhu, Appl. Phys. Lett. 88, 061913 (2006).
15. S. Walheim, E. Schaffer, J. Mlynek, and U. Steiner, Science 283, 520 (1999).
16. K. Xiong, J. Robertson, M. C. Gibson, and S. J. Clark, Appl. Phys. Lett. 87, 183505 (2005).
17. M. M. Zhu, Z. J. Zhang, and W. Miao, Appl. Phys. Lett. 89, 021915 (2006).
18. J. Ni, Q. Zhou, Z. C. Li, and Z. J. Zhang, Appl. Phys. Lett. 93, 011905 (2008).