Annealing effect of pulsed laser deposited transparent conductive Ta-doped titanium oxide films

Chinese Physics Letters

Volumn 28, Issue 11, 2011, Pages

  Wu, Bin Bin ^a   Pan, Feng Ming ^a   Yang, Yu E ^a  

^a NANJING UNIVERSITY OF AERONAUTICS AND ASTRONAUTICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CONDUCTIVE FILMS; PULSED LASERS; TANTALUM OXIDES; TITANIUM DIOXIDE; TRANSPARENT CONDUCTING OXIDES;

2-STRUCTURE; ANATASE TIO 2; ANNEALING EFFECTS; ANNEALING IN VACUUM; DOPED TITANIA; POSTANNEALING; PULSED-LASER DEPOSITION; TIO 2 FILMS; TITANIUM OXIDE FILMS; TRANSPARENT CONDUCTIVE;

PULSED LASER DEPOSITION;

EID: 82055193193     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/28/11/118102     Document Type: Article

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