Transparent conducting indium oxide thin films grown by low-temperature metal organic chemical vapor deposition

Thin Solid Films

Volumn 515, Issue 5, 2007, Pages 2921-2925

  Wang, Chunyu ^a   Cimalla, Volker ^a   Cherkashinin, Genady ^a   Romanus, Henry ^a   Ali, Majdeddin ^a   Ambacher, Oliver ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Grain size; Indium oxide; Metal organic chemical vapor deposition; X ray diffraction

Indexed keywords

FILM GROWTH; INDIUM COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPACITY; POLYCRYSTALLINE MATERIALS;

OPTICAL BAND GAP; REACTOR PRESSURE; SILICON SUBSTRATES; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 33845936317     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.08.030     Document Type: Article

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