Carbon nanotube integrated 3-dimensional carbon microelectrode array by modified SU-8 photoresist photolithography and pyrolysis

Thin Solid Films

Volumn 520, Issue 3, 2011, Pages 1041-1047

  Zhang, Lei ^a   Shi, Tielin ^a   Xi, Shuang ^b   Liu, Dan ^a   Tang, Zirong ^b   Li, Xiaoping ^b   Lai, Wuxing ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Carbon nanotubes; Current voltage measurements; Lithography; Microelectrode array; Pyrolysis; Scanning electron microscopy; Su 8 Resin

Indexed keywords

3-DIMENSIONAL; 3-DIMENSIONAL CARBON; BIOLOGICAL DETECTION SYSTEMS; CARBON MICROELECTRODES; CURRENT-VOLTAGE MEASUREMENTS; ELECTRICAL PERFORMANCE; HIGH-TEMPERATURE PYROLYSIS; INTEGRATED MICROELECTRODES; INTEGRATED STRUCTURE; INTEGRATION STRATEGY; MASS PRODUCTION; MICRO-NANO; MICROELECTRODE ARRAY; MONO-DISPERSED; PHOTOLITHOGRAPHY PROCESS; POTENTIAL APPLICATIONS; SCANNING ELECTRONS; SU-8 PHOTORESIST;

CARBON; CHEMICAL DETECTION; GLASSY CARBON; INTEGRATION; LITHOGRAPHY; MICROELECTRODES; PHOTORESISTS; PYROLYSIS; SCANNING ELECTRON MICROSCOPY;

CARBON NANOTUBES;

EID: 81855178302     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.07.055     Document Type: Conference Paper

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