Microstructure and phase behavior of a quinquethiophene-based self-assembled monolayer as a function of temperature

Journal of Physical Chemistry C

Volumn 115, Issue 46, 2011, Pages 22925-22930

  Flesch, Heinz Georg ^a   Mathijssen, Simon G J ^b,c   Gholamrezaie, Fatemeh ^b,d   Moser, Armin ^a   Neuhold, Alfred ^a   Novák, Jirí ^a   Ponomarenko, Sergei A ^e   Shen, Quan ^f   Teichert, Christian ^f   Hlawacek, Gregor ^f,g   Puschnig, Peter ^f   Ambrosch Draxl, Claudia ^f   Resel, Roland ^a   De Leeuw, Dago M ^b,d  

^a GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

^c EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^d UNIVERSITY OF GRONINGEN   (Netherlands)

^e ENIKOLOPOV INSTITUTE OF SYNTHETIC POLYMER MATERIALS   (Russian Federation)

^f UNIVERSITY OF LEOBEN   (Austria)

^g UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DEVICE PERFORMANCE; GRADUAL CHANGES; GRAZING-INCIDENCE X-RAY SCATTERING; IN-SITU TEMPERATURE; LATERAL SIZES; LAYER FORMATION; LONG RANGE ORDERS; MOLECULAR PACKINGS; ORGANIC ELECTRONICS; POLYGONAL SHAPES; SHAPE AND SIZE; SILICON OXIDE SURFACES; STRUCTURAL SOLUTIONS; TEMPERATURE TREATMENTS; TRANSVERSE SHEAR; TWO-DIMENSIONAL CRYSTALS;

CRYSTAL STRUCTURE; SILICON COMPOUNDS; SILICON OXIDES; STRUCTURAL PROPERTIES; TWO DIMENSIONAL;

SELF ASSEMBLED MONOLAYERS;

EID: 81755176070     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp206033x     Document Type: Article

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