Selective growth, characterization, and field emission performance of single-walled and few-walled carbon nanotubes by plasma enhanced chemical vapor deposition

Applied Surface Science

Volumn 258, Issue 4, 2011, Pages 1366-1372

  Ionescu, Mihnea Ioan ^a   Zhang, Yong ^a   Li, Ruying ^a   Sun, Xueliang ^a  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

Author keywords

Carbon nanotubes; Plasma enhanced chemical vapor deposition

Indexed keywords

CARBON NANOTUBES; CATALYSTS; ELECTRON EMISSION; FIELD EMISSION; FIELD EMISSION MICROSCOPES; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; IRON; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; TEMPERATURE; TRANSMISSION ELECTRON MICROSCOPY; YARN;

CATALYST THICKNESS; ELECTRON FIELD EMISSION PROPERTIES; EMISSION PERFORMANCE; FEW-WALLED CARBON NANOTUBES; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; PARAMETRIC STUDY; SINGLE-WALLED CARBON NANOTUBE (SWCNTS); SUBSTRATE DISTANCE;

SINGLE-WALLED CARBON NANOTUBES (SWCN);

EID: 81555205724     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.09.065     Document Type: Article

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