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Volumn 19, Issue 25, 2008, Pages
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Effect of ion bombardment on the synthesis of vertically aligned single-walled carbon nanotubes by plasma-enhanced chemical vapor deposition
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Author keywords
[No Author keywords available]
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Indexed keywords
AEROSPACE APPLICATIONS;
CARBON;
CARBON NANOTUBES;
CHARGED PARTICLES;
CUBIC BORON NITRIDE;
ELECTRONS;
ETCHING;
ETHYLENE;
FULLERENES;
GASES;
ION BOMBARDMENT;
IONS;
IRON;
METALLIZING;
MICROFLUIDICS;
NANOCOMPOSITES;
NANOPORES;
NANOSTRUCTURED MATERIALS;
NANOSTRUCTURES;
NANOTECHNOLOGY;
NANOTUBES;
PHOTOACOUSTIC EFFECT;
PLASMA (HUMAN);
PLASMA DEPOSITION;
PLASMA DIAGNOSTICS;
PLASMA SHEATHS;
PLASMAS;
POWER QUALITY;
PRESSURE;
SINGLE-WALLED CARBON NANOTUBES (SWCN);
SYNTHESIS (CHEMICAL);
VAPOR DEPOSITION;
VAPORS;
CAPACITIVELY COUPLED;
CARBON SOURCES;
ETCHING EFFECT;
GAS PRESSURES;
HIGH QUALITY (HQ);
INPUT POWERS;
ION FLUXES;
LOW TEMPERATURE (LTR);
PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);
RADIO FREQUENCY (RF);
SINGLE-WALLED CARBON NANOTUBES (SWCNTS);
STRUCTURAL DEFECTS;
STRUCTURAL TRANSITIONS;
SYNTHESIS (OF CHIRAL IONIC LIQUIDS);
VERTICALLY ALIGNED;
WALLED NANOTUBES;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
ETHYLENE;
IRON;
SINGLE WALLED NANOTUBE;
ARTICLE;
CATALYST;
CHEMICAL STRUCTURE;
FILM;
ION TRANSPORT;
PRIORITY JOURNAL;
SYNTHESIS;
TEMPERATURE SENSITIVITY;
VAPOR;
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EID: 44949179307
PISSN: 09574484
EISSN: 13616528
Source Type: Journal
DOI: 10.1088/0957-4484/19/25/255607 Document Type: Article |
Times cited : (28)
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References (23)
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