Diffusion and submonolayer growth of para-sexiphenyl on Ir(111) and Ir(111)-supported graphene

IBM Journal of Research and Development

Volumn 55, Issue 4, 2011, Pages

  Hlawacek, G ^a   Khokar, F S ^a   Van Gastel, R ^a   Teichert, C ^b   Poelsema, B ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b UNIVERSITY OF LEOBEN   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION BARRIERS; CRITICAL NUCLEUS SIZE; DIFFUSION PROCESS; GRAPHENE SHEETS; IR(111); NUCLEATION AND GROWTH; PARA-SEXIPHENYL; ROOT CAUSE; STABLE CLUSTERS; STEP EDGE; SUBMONOLAYER;

DIFFUSION; GRAPHENE; LIGHT EMITTING DIODES; MOLECULES;

IRIDIUM;

EID: 81255209958     PISSN: 00188646     EISSN: 21518556     Source Type: Journal    
DOI: 10.1147/JRD.2011.2160303     Document Type: Conference Paper

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