SCOPUS 정보 검색 플랫폼

Volumn 95, Issue 12, 2009, Pages

Selecting a single orientation for millimeter sized graphene sheets

(10) Van Gastel, R a N'Diaye, A T b Wall, D c Coraux, J d Busse, C b Buckanie, N M c Meyer Zu Heringdorf, F J c Horn Von Hoegen, M c Michely, T b Poelsema, B a

a UNIVERSITY OF TWENTE (Netherlands)

b UNIVERSITY OF COLOGNE (Germany)

c UNIVERSITY OF DUISBURG ESSEN (Germany)

d LABORATOIRE DE CRISTALLOGRAPHIE (France)

Author keywords

[No Author keywords available]

Indexed keywords

CYCLIC GROWTH; ELECTRONIC DEVICE; ELEVATED TEMPERATURE; ETCH RATES; GRAPHENE SHEETS; GRAPHENES; HIGH DENSITY; HIGH QUALITY; IR(111); LIFTOFF TECHNIQUE; LOW ENERGY ELECTRON MICROSCOPY; NANOMAGNETISMS; PHOTOEMISSION ELECTRON MICROSCOPY; PURE FILMS; SINGLE ORIENTATIONS;

ELECTRON EMISSION; FILMS; GRAPHITE; HYBRID MATERIALS; IRIDIUM; SUBSTRATES;

CHEMICAL VAPOR DEPOSITION;

EID: 70349659682 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3225554 Document Type: Article

Times cited : (108)

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- F. -J. Meyer zu Heringdorf, A. T. N'Diaye, D. Wall, J. Coraux, N. M. Buckanie, C. Busse, R. van Gastel, B. Poelsema, M. Horn von Hoegen, and T. Michely (unpublished).
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