Nanocomposite por-Si/SnOx layers formation for gas microsensors

Materials Science and Engineering: B

Volumn 177, Issue 1, 2012, Pages 1-7

  Bolotov, V V ^a   Korusenko, P M ^a   Nesov, S N ^a   Povoroznyuk, S N ^a   Roslikov, V E ^a   Kurdyukova, E A ^a   Sten'Kin, Yu A ^a   Shelyagin, R V ^a   Knyazev, E V ^a   Kan, V E ^a   Ponomareva, I V ^a  

^a INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

Author keywords

Auger; Gas sensor; Nanocomposite; SEM; TEM; XPS

Indexed keywords

ATOMIC LAYER DEPOSITION; ATOMS; AUGERS; CHEMICAL SENSORS; CHEMICAL VAPOR DEPOSITION; CRYSTAL ATOMIC STRUCTURE; GAS DETECTORS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; NANOCOMPOSITES; POROUS SILICON; TIN OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

AUGE; CHEMICAL VAPOUR DEPOSITION; GAS MICRO SENSORS; GAS-SENSORS; LAYER FORMATION; MAGNETRON-SPUTTERING; NANO-COMPOSITE LAYERS; NONSTOICHIOMETRIC; TEM; TIN ATOMS;

SCANNING ELECTRON MICROSCOPY;

EID: 81055140209     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2011.09.006     Document Type: Article

References (24)

1. Y.X. Liang, Y.J. Chen, and T.H. Wang Appl. Phys. Lett. 85 2004 666 668
2. R. Angelucci, A. Poggi, L. Dori, G.C. Cardinali, A. Parisini, A. Tagliani, M. Mariasaldi, and F. Cavani Sens. Actuators A 74 1999 95 99
3. C. Cobianu, C. Savaniu, O. Buiu, D. Dascalu, M. Zaharescu, C. Parlog, A. van den Berg, and B. Pecz Sens. Actuators B 43 1997 114 120
4. U. Gruning, and A. Yelon Thin Solid Films 255 1995 135 138
5. S. Borini J. Appl. Phys. 102 2007 093709
6. G. Amato, L. Boarino, and F. Bellotti Appl. Phys. Lett. 85 2004 4409 4411
7. Z. Gaburro, C.J. Oton, L. Pavesi, and L. Pancheri Appl. Phys. Lett. 84 2004 4388 4390
8. H. Meixner, and U. Lampe Sens. Actuators B 33 1996 198 202
9. K. Kalantar-zadeh, and B. Fry Nanotechnology-Enabled Sensors 2008 Springer Science + Business Media
10. V.V. Bolotov, A. Yu, N. Sten'kin, A. Davletkil'deev, O.V. Krivozubov, and I.V. Ponomareva Semiconductors 43 2009 92 95
11. V. Aroutiounian, V. Arakelyan, V. Galstyan, K. Martirosyan, and P. Soukiassian IEEE Sens. J. 9 2009 9 12
12. F. Sun, M. Hu, P. Sun, J. Zhang, and B. Liu J. Nanosci. Nanotechnol. 11 2010 7739 7742
13. Y.F. Dong, L.Y. Li, W.F. Jiang, H.Y. Wang, and X.J. Li Phys. E Low Dimens. Syst. Nanostructures 41 2009 711 714
14. Y. Wang, and J.T.W. Yeow IEEE Sens. J. 9 2009 541 547
15. N.S. Subramanian, R.V. Sabaapathy, P. Vickraman, G.V. Kumar, R. Sriram, and B. Santhi Ionics 13 2007 323 328
16. V.V. Bolotov, Yu.A. Sten'kin, V.E. Roslikov, V.E. Kan, I.V. Ponomareva, and S.N. Nesov Semiconductors 43 2009 925 928
17. L.E. Davis, N.C. MacDonald, P.W. Palmberg, G.E. Riach, and R.E. Weber Handbook of Auger Electron Spectroscopy 1986 PEI Minnesota
18. C.D. Wagner, W.M. Riggs, L.E. Davis, J.F. Moulder, and G.E. Mullenberg Handbook of X-Ray Photoelectron Spectroscopy 1986 PEI Minnesota
19. G. Hoflund, and D. Asbury Thin Solid Films 129 1985 139 150
20. E.P. Domashevskaya, S.V. Ryabtsev, S. Yu, V.M. Turishchev, Yu.A. Kashkarov, O.A. Yurakov, A.V. Chuvenkova, and X.P.S. Shukarev Conden. Mat. Phase Boundaries 10 2008 98 108 (in Russian)
21. D. Briggs, and M.P. Seach Practical Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy 1983 John Wiley & Sons Chichester
22. G.E. Buono-Core, G.A. Cabello, H. Espinoza, A.H. Klahn, M. Tejos, and R.H. Hill J. Chin. Chem. Soc. 51 2006 950 956
23. S. Turishchev, A. Lenshin, E. Domashevskaya, V. Kasharov, V. Terekhov, K. Pankov, and D. Khoviv Phys. Status Solidi C 6 2009 1651 1655
24. H. Elhouichet, A. Moadhen, M. Oueslati, S. Romdhane, J.A. Roger, and H. Bouchriha Phys. Status Solidi C 2 2005 3349 3353