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Volumn 10, Issue 11, 2010, Pages 7739-7742

NH 3 sensing characteristics of Nano-W0 3 thin films deposited on porous silicon

Author keywords

Nano tungsten trioxide (W0 3) thin films; NH 3 sensing characteristics; Porous silicon; Room temperature

Indexed keywords

DC MAGNETRON SPUTTERING; GAS SENSORS; NANO FILMS; NANO-TUNGSTEN TRIOXIDE (W0 3) THIN FILMS; NH 3 SENSING CHARACTERISTICS; P-TYPE SILICON; POROUS SILICON LAYERS; PT ELECTRODE; ROOM TEMPERATURE; SEM; SENSING CHARACTERISTICS; SENSING MECHANISM; TOP SURFACE; TUNGSTEN TRIOXIDE; XPS; XRD;

EID: 79955525906     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2010.2815     Document Type: Conference Paper
Times cited : (28)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.