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Volumn 10, Issue 11, 2010, Pages 7739-7742
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NH 3 sensing characteristics of Nano-W0 3 thin films deposited on porous silicon
a a a a a |
Author keywords
Nano tungsten trioxide (W0 3) thin films; NH 3 sensing characteristics; Porous silicon; Room temperature
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Indexed keywords
DC MAGNETRON SPUTTERING;
GAS SENSORS;
NANO FILMS;
NANO-TUNGSTEN TRIOXIDE (W0 3) THIN FILMS;
NH 3 SENSING CHARACTERISTICS;
P-TYPE SILICON;
POROUS SILICON LAYERS;
PT ELECTRODE;
ROOM TEMPERATURE;
SEM;
SENSING CHARACTERISTICS;
SENSING MECHANISM;
TOP SURFACE;
TUNGSTEN TRIOXIDE;
XPS;
XRD;
GAS DETECTORS;
HYDROFLUORIC ACID;
NANOSENSORS;
PLATINUM;
SEMICONDUCTING SILICON COMPOUNDS;
THIN FILMS;
TUNGSTEN;
POROUS SILICON;
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EID: 79955525906
PISSN: 15334880
EISSN: None
Source Type: Journal
DOI: 10.1166/jnn.2010.2815 Document Type: Conference Paper |
Times cited : (28)
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References (16)
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